EUV Gets $500M Center

Globalfoundries, New York partner on center

by Rick Merritt, SiliconValley Bureau Chief, EETimes, Feb. 10, 2016 – 

SAN JOSE, Calif. - Globalfoundries and SUNY Polytechnic Institute will spend a total of $500 million over five years to create a new R&D center to accelerate the introduction of Extreme Ultraviolet (EUV) lithography into the 7nm process node and beyond. The move is the latest sign EUV will finally make its way into production fabs, albeit probably not until 2018 or later.

The Advanced Patterning and Productivity Center (APPC) will be located at the Colleges of Nanoscale Science and Engineering (CNSE) in Albany, N.Y. It will have a ASML NXE:3300 EUV scanner and a staff of about 100 researchers.

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