GlobalFoundries to Soon Pilot 7nm and EUV Production

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Feb. 05, 2018 – 

Extreme Ultraviolet Lithography, or EUV, has been stuck somewhere between a mirage and reality for over a decade, shimmering faintly on the horizon with promises of "4-5 years away." Meanwhile, other technologies like immersion lithography and multipatterning have been deployed to extend the limits of 193nm lithography far past its original limit. But even the best research teams and scientists can only extend something for so long. Last week, we had the opportunity to tour GlobalFoundries' Fab 8, in Malta, N.Y., and to sit down and talk about how the company's roadmaps and timelines look through 2018 and beyond.

First, despite being built from the ground up as a 28nm fab back in 2012, the fab has been converted entirely to 14nm, with initial 7nm pilot production also underway. All previous nodes have been moved to other facilities. GlobalFoundries 22FDX platform (that's the 22nm planar FD-SOI solution), for example, is built in Dresden, at the former AMD foundry now known as Fab 1.

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