Samsung to buy ASML’s most advanced lithography tools to rival TSMC

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Oct. 16, 2025 – 

Samsung is expected to deploy high NA EUV machines at its 2 nm foundry lines, which will make Exynos 2600 AP and Tesla’s next-generation AI chips

By Jeong-Soo Hwang, Chae-Yeon Kim and Eui-Myung Park

Samsung Electronics Co., a leading memory chipmaker, is making a renewed bet on next-generation semiconductor manufacturing, committing 1.1 trillion won ($773 million) to acquire two of ASML Holding N.V.’s most advanced extreme ultraviolet (EUV) lithography machines by mid-next year – a move seen as a critical step to regaining its technological edge in the global chip race.

According to industry sources on Wednesday, the South Korean tech giant is expected to take delivery of its first high-numerical-aperture (high NA) EUV scanner, the Twinscan EXE:5200B, later this year, followed by a second unit in the first half of 2026.

While Samsung already operates a research-use high NA EUV tool at its Hwaseong campus, the upcoming machines mark its first purchases intended for mass production, sources said.

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