ASML announces breakthrough in EUV light source to boost chip output

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Mar. 02, 2026 –

By Neil Tyler, New Electronics

ASML has unveiled a significant advance in the power of the light source used in its extreme ultraviolet (EUV) lithography systems, a development the company says could enable chipmakers to produce up to 50% more semiconductors by the end of the decade.

The Dutch company is the sole supplier of commercial EUV lithography machines, which are essential for manufacturing the world’s most advanced chips. Firms including TSMC and Intel rely on EUV systems to produce cutting-edge processors for computers, smartphones and AI hardware.

Michael Purvis, ASML’s lead technologist for EUV light sources, said the new system is capable of “producing 1,000 watts under all the same requirements that you could see at a customer”.

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