Samsung Foundry updates process roadmap to move 1.4nm node to 2029 — high-NA EUV will enable 1nm-class and smaller nodes in 2030 and beyond

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Aug. 17, 2026 –

Samsung Foundry's plans change significantly from the 2024 roadmap.

By Anton Shilov, tomshardware.com

Samsung Foundry presented its updated fabrication technologies roadmap at the 2026 Next-Generation Lithography + Patterning Conference (NGL 2026) this week, revealing some major changes compared to the 2024 roadmap, reports ZDNet Korea. Instead of rushing its SF1.4 node (1.4nm-class) to the market, Samsung will focus on refining its SF2 (2nm-class) manufacturing processes in the next three years. And starting with its SF1A (1nm-class) fabrication node, Samsung intends to adopt High-NA EUV lithography tools, the first time the company confirms the plan.

Before moving on to 10-angstrom (or 1nm-class) node around 2030, Samsung will refine its SF2-series manufacturing technologies (which includes SF2P, SF2X, SF2A, and SF2Z with backside power delivery) and introduce its SF1.4 process in 2029.

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